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Lesker Thin Film Deposition System
The KJLC AXXIS system provides three mechanisms for film deposition: thermal evaporation, electron-beam induced deposition, and DC & RF magnetron sputtering enabling the deposition of insulating and magnetic as well as conductive materials. |
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Chemical Vapor Deposition (CVD) Reactor
This is where many of our carbon nanotubes (CNTs) are manufactured. Experiments are run using different pressures, gases, gas flow rates, catalysts, temperatures, and reaction times. |
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Chemical Vapor Deposition (CVD) Reactor
An additional CVD allows for parallel growth processes. It is equipped with with a 4W Q-switched Nd:YAG laser (capable of operating at 1064, 532, or 255 nm), allowing for ablation-based depositions. |
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Horiba Raman System
The HR800 UV utilizes a 100 mW 532 nm laser for Raman spectroscopy as well as a 10 mW 372 nm source for measuring photolumniescence properties. It has a built-in mapping function to show the distribution of specific excitations. |
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Spectrometer
The UV-3600 allows for spectral, photometry, or kinetic measurements of reflection, absorption, and transmission for bulk, thin-film, or liquid-suspended materials for wavelength ranges between 3300-190 nm. |
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PECVD Chamber
A plasma enhanced chemical vapor deposition (PECVD) reactor generates aligned growth due to the presence of an electromagnetic field during the growth phase. This field results in a visible plasma during operation of the system. The entire growth process can be automated via software code. |
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Field Emission Scanning Electron Microscope (SEM)
FEI Sirion FESEM, 30kV microscope equipped with Oxford Inca Energy 250 EDX system. The combination of Schottky type field emission source and the through-lens detection technology constitutes the basis for the ultra-high resolution. The high resolution EDX attachment allows for simultaneous chemical analysis. Complete computer control makes user friendly operation possible. |
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Phenom Desktop SEM
The Phenom Desktop SEM is a high-resolution desktop imaging tool, bridging the gap between optical and electrical technologies. This machine is capable of imaging a sample to 20,000x magnification in less than 30 seconds. Its low vacuum design makes is applicable for a variety of samples. |
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Transmission Electron Microscope (TEM)
FEI Tecnai F-20 field emission high resolution TEM (200kV). This is a highly advanced, state-of-the-art instrument. This instrument provides a unique combination of outstanding performance, ease-of-use and high-resolution performance in micro-analysis and (S)TEM imaging. It has Schottky type field emission source giving ultra-high brightness and is normally operated at 200 kV. The point resolution is 0.24 nm and line resolution 0.10 nm. The equipped EDAX EDS system enables elemental analysis in the nanometer order. The GIF, on the other hand, adds energy-loss spectroscopy and filtered imaging capabilities to this TEM. Attachment of US, MSC, and TV rate CCD cameras enables the digital recording of images. |
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Dual Beam Focused Ion Beam Microscope (FIB)
FEI Company DB237: This instrument is often used to characterize samples. It has the milling and deposition capabilities as well as composition depth profiling and three-dimensional image construction.. In addition to the regular function of focused ion beam processing, it has the function of Secondary Ion Mass Spectroscopy. |
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Ultra-High Vacuum and Variable Pressure Probe Station
A custom designed electrical probe station capable of ultra high vacuum (1x10-9 torr) base pressure, sample heating up to 500C, and precision leak gas (O2, CO2, H2O, etc.) control. The system is equipped with modular probes capable of a variety of measurements including IV characterization, four-point probe resistance, field emission and photo-luminescence. |
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CRC-300 Compact Research Sputtering System
A desktop magnetron sputtering system capable of depositing magnetic and non-magnetic metals, insulators and dielectrics. |
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Ultra High Vacuum Field Emission Probe System
An ultra-high vacuum (UHV) chamber is used to perform surface analysis and field emission measurements. Base pressure for this system is 1x10-9 Torr. A moveable anode probe and three-axis stage allow specific sites on samples to be evaluated. |
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Solar Cell Test System
The system includes a Keithley 2400 digital source meter and a 150 W solar simulator (Newport). It provides the capability for the electrical characterization of solar cells and panels for space and terrestrial applications. |
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Precision Semiconductor Parameter Analyzer and Probe Station
Agilent 4156C Precision Semiconductor Parameter Analyzer and Probe Station with MicroChamber. Together, these instruments allow us to access electrical measurements of nanoscale devices. |
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Specimen Preparation Room (TEM)
This room is equipped for TEM specimen preparation with the following: plasma cleaner, precision ion polishing system,precision polishing machine, ultrasonic disc cutter, disc punch, dimple grinder, disc grinder, specimen mounting hot plate, and optical Microscope. |
